To obtain a newly technical means having simple configuration and easy operation capable of mechanically applying a polishing pad on upper and lower surface plates in a double sided polishing device by using a pressure roller.
The pressure roller 20A composed of a cylindrical roller body 21 and a roller shaft 22 rotatably supporting the roller body 21 is mounted on a device body through a support mechanism 25. When applying a pad to surface plates 1, 2, the pressure roller 20A is radially interposed between the upper and lower surface plates 1, 2 by the position operation with the support mechanism 25. The roller body 21 is driven to rotate by rotating the upper and lower surfaces 1, 2 in the reverse direction with each other to press and attach the polishing pad 5 to the applying surfaces 1a, 2a of the pad by the rotating roller body 21.
YAMATANI AKIHIKO
| JPS62102974A | 1987-05-13 | |||
| JPH11320387A | 1999-11-24 | |||
| JPH11300599A | 1999-11-02 | |||
| JPH09225812A | 1997-09-02 | |||
| JP2000024909A | 2000-01-25 | |||
| JP2006346808A | 2006-12-28 |
Masahiko Goto
Hayashi Naoki