Title:
描画方法、および、描画装置
Document Type and Number:
Japanese Patent JP7431532
Kind Code:
B2
Abstract:
To suppress reduction of a depth of focus and achieve refinement of a formed pattern shape.SOLUTION: A drawing method comprises: a step for radiating drawing light in a second drawing pattern having a first shift pattern at least partially, to a photo sensitive material; a step for developing the photo sensitive material; and a step for forming a first pattern shape on a top face of a substrate. The first shift pattern overlaps at least partially to a corresponding unit pattern on the first drawing pattern, and is deviated from the corresponding unit pattern.SELECTED DRAWING: Figure 7
Inventors:
Hiroshi Matsui
Yoshitaka Yoshinao
Yoshitaka Yoshinao
Application Number:
JP2019151182A
Publication Date:
February 15, 2024
Filing Date:
August 21, 2019
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
G03F7/22
Domestic Patent References:
| JP3001522A | ||||
| JP2013149708A | ||||
| JP2018081153A | ||||
| JP2007298989A | ||||
| JP2007281455A |
Foreign References:
| US20030096200 |
Attorney, Agent or Firm:
Hidetoshi Yoshitake
Takahiro Arita
Takahiro Arita
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