研磨布用ドレッサー及びその製造方法

Japanese Patent JP5295868

B2

To provide a dresser for a polishing cloth in which a stable dressing performance is maintained, a uniformly polished surface is provided on the surface of the polishing cloth, and in particular, a scratch on a wafer caused by the dissociation of abrasive grains is prevented, and a method for producing the same A dresser for a polishing cloth includes a base 1 and a dressing part disposed on the surface of the base. The dressing part includes a plurality of abrasive grains 2 and a plate-shaped holding component 3 that holds the abrasive grains 2 . The holding component 3 is composed of cemented carbide, cermet, or ceramic. Alternatively, the holding component 3 may be composed of a material containing silicon to which silicon dioxide is added. A method for producing the dresser for a polishing cloth includes a step of forming adhesive portions having almost the same diameter as that of the abrasive grains at positions corresponding to holding positions of the abrasive grains 2 to be arrayed with regularity, the positions being disposed on the surface of the holding component or a sheet disposed on the holding component; adhering the abrasive grains 2 on the adhesive portions; and sintering the holding component 3 to fix the abrasive grains 2.

Tadakatsu Nabeya

JP2009132037A

September 18, 2013

June 01, 2009

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Lead Co., Ltd.

B24B53/12; B24B1/00; B24B53/02; B24D3/00; B24D3/14; B32B9/04; H01L21/304

JP2002127017A
JP2001179638A
JP2145261A
JP2001210613A
JP6251904A
JP2003507318A
JP10114581A
JP3290358A

Hayashi Naoki
Hiroshi Hayashi

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