To resolve metal contamination of an abrasive cloth and remaining of diamond abrasive grains and to increase chemical resistance against abrasive slurry at low price.

With the use of a dressing jig 10 composed of sintered bodies 19 made of ceramics, the acting surface of an abrasive cloth is free from metal contamination during dressing, and diamond abrasive grains do not remain thereon. Even during grinding by means of the abrasive cloth after dressing, a wafer is free from metal contamination and is not damaged by the abrasive grains. The sintered bodies 19 suffer less abrasion, and durability of the dressing jig 10 increases. Chemical resistance against abrasive slurry adhered to the acting surface during grinding of the wafer is high. Accordingly, the surface properties of the jig 10 can be maintained. In cases where alumina sintered bodies with purity as high as 97% or more are used, they are low-priced and have higher chemical resistance. In the case of sintered bodies having a bulk specific gravity of 3.7 or more, they are dense and are free of chips.