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Title:
乾式クリーニング筐体及び乾式クリーニング装置
Document Type and Number:
Japanese Patent JP5862262
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a dry type cleaning case with which cleaning unevenness is suppressed highly precisely in a constitution of simultaneously cleaning a large area without causing the leakage problem of a cleaning medium.SOLUTION: A dry type cleaning case 40 includes: a suction opening 8; porous separation plates 44 disposed at both sides of the circulation axis of a case body 42; a member 52 for regulating the flow path, defining the circulation axis; an inlet 50 for generating a circulation air flow inside the case body 42; and a mask unit 54 for shielding arbitrary a part of the inlet 50. The mask unit 54 includes: a mask plate 56 corresponding to each inlet area; and a unit 58 for driving a mask plate to move the mask plate 56 in order to open and close the inlet area. When the mask shields the area where the amount of a cleaning medium is small due to the uneven distribution of the cleaning medium, the cleaning medium gathers to this area. Using this principle, the deviation of the cleaning medium in the direction of the circulation axis is corrected and uneven cleaning is suppressed.

Inventors:
Yusuke Taneda
Yoichi Okamoto
Akihiro Fuchigami
Koji Tsukahara
Shozo Murata
Application Number:
JP2011271523A
Publication Date:
February 16, 2016
Filing Date:
December 12, 2011
Export Citation:
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Assignee:
株式会社リコー
International Classes:
B08B5/04; B08B1/00
Domestic Patent References:
JP7088446A
JP4083567A
JP60188123A
JP2007029945A
JP2010264448A
Attorney, Agent or Firm:
Shogo Honda
Toru Kabayama
Shuichi Kudo