Title:
効率的位相欠陥部検出システムおよび方法
Document Type and Number:
Japanese Patent JP2004526168
Kind Code:
A
Abstract:
The ability to inspect photomasks for errors or defects in phase-shifters is greatly enhanced using optical techniques based on multiple modified radiation collection techniques. In particular, the apparatus and methods of the invention allows for errors in phase-shifters to be more accurately detected, even in the presence of regular amplitude objects such as grid lines. In one embodiment, the intensities of two slightly defocused images of phase objects corresponding to the same photomask location are compared. In a second embodiment, radiation having two Zernike point spread functions is used to obtain two slightly different phase sensitive images. Data collected and analyzed using this method provides much greater sensitivity to phase objects and errors in phase objects than prior art inspection systems. Embodiments include both scanning-type and projector-type optical architectures and may utilize radiation transmitted or reflected by a sample.
Inventors:
Krantz, Martius Sea.
Bill, Mark-Joseph
Stokkowski, Stanley E.
Bill, Mark-Joseph
Stokkowski, Stanley E.
Application Number:
JP2002588230A
Publication Date:
August 26, 2004
Filing Date:
May 02, 2002
Export Citation:
Assignee:
KLA-Tenker Corporation
International Classes:
G01N21/956; G03F1/84; G03F1/26; (IPC1-7): G01N21/956
Attorney, Agent or Firm:
Toshi Inoguchi