Title:
物理的気相堆積チャンバ内電磁石
Document Type and Number:
Japanese Patent JP7199515
Kind Code:
B2
Abstract:
A PVD chamber deposits a film with high thickness uniformity. The PVD chamber includes a coil of an electromagnetic that, when energized with direct current power, can modify plasma in an edge portion of the processing region of the PVD chamber. The coil is disposed within the vacuum-containing portion of the PVD chamber and outside a processing region of the PVD chamber.
Inventors:
west bryan tee
Cox Michael S
Jello Miroslav
Somana Dinkesh
Cox Michael S
Jello Miroslav
Somana Dinkesh
Application Number:
JP2021512361A
Publication Date:
January 05, 2023
Filing Date:
April 17, 2019
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C14/34; H01L21/285; H05H1/46
Domestic Patent References:
| JP2008500457A |
Foreign References:
| US20080141939 | ||||
| US20150279634 | ||||
| US20040094402 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
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