Title:
ELECTRON BEAM APPARATUS, EVALUATION METHOD AND DEVICE MANUFACTURING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2003133380
Kind Code:
A
Abstract:
To provide an electron beam apparatus, where installation of an optical microscope in an evacuated atmosphere is eliminated and alignment is realized, without having to conduct prealignment, and to provide an evaluating method.
The size of X-direction or Y-direction of the field of vision 23 of SEM is set to become larger than the widths of dicing lines 21 and 22. Loading precision is set to be within a prescribed range, and alignment is conducted, by using the dicing lines 21 and 22 or a pattern 26 near the dicing lines 21 and 22. A means for determining a region to be inspected, based on SEM image, is disposed, and a stage is moved in a direction of preventing the region to be inspected, from going out of the field of vision of SEM.
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Inventors:
NAKASUJI MAMORU
OWADA SHIN
SATAKE TORU
OWADA SHIN
SATAKE TORU
Application Number:
JP2001330698A
Publication Date:
May 09, 2003
Filing Date:
October 29, 2001
Export Citation:
Assignee:
EBARA CORP
International Classes:
G01B15/00; G01N23/225; G01R31/02; G01R31/302; H01J37/20; H01J37/28; H01L21/66; (IPC1-7): H01L21/66; G01B15/00; G01N23/225; G01R31/02; G01R31/302; H01J37/20; H01J37/28
Attorney, Agent or Firm:
Kazuo Shamoto (5 outside)