Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM EQUIPMENT AND ASTIGMATISM ADJUSTMENT METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2008097902
Kind Code:
A
Abstract:

To adjust astigmatism rapidly with a simple algorithm by utilizing the auto focus evaluation value of an image acquired from a pattern formed in a sample.

The electron beam equipment observes and evaluates the sample by applying electron beams to the sample W, and detecting secondary electrons, such as electrons, reflection electrons, and backscattering electrons, radiated from the sample. The electron beam equipment has an astigmatism adjustment means 17 for adjusting the astigmatism of electron beams and gives a correction voltage for maximizing the focus evaluation value obtained from the image of a pattern formed in the sample W to the astigmatism adjustment means 17. The astigmatism adjustment means 17 is a multi-pole having a plurality of pairs of electrodes or coils that oppose with the light axis of electron beams as a center.


Inventors:
WATANABE KENJI
MURAKAMI TAKESHI
TAJIMA RYO
HATAKEYAMA MASAKI
TSUNEOKA MASATOSHI
Application Number:
JP2006276058A
Publication Date:
April 24, 2008
Filing Date:
October 10, 2006
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
EBARA CORP
International Classes:
H01J37/153; H01J37/21
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Hideo Tanaka
Otsuka Sumie
Fumitoshi Nishiyama