Title:
ELECTRON BEAM EXPOSURE METHOD AND PATTERN FORMATION METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2002217096
Kind Code:
A
Abstract:
To provide an electron beam exposure method using a VSB system and a pattern formation method using the same.
In order to expose a plurality of patterns having various CD values by an electron beam exposure method using a VSB system, a CD design value of one pattern selected from the plurality of patterns is determined. When the CD design value exceeds a predetermined value, the aforementioned one pattern is exposed using a first preset dose. When the CD design value is equal to the predetermined value or lower, the aforementioned one pattern is exposed using a second dose, which is obtained by adding a correction dose to the first dose.
Inventors:
YANG SEUNG-HUNE
Application Number:
JP2001340663A
Publication Date:
August 02, 2002
Filing Date:
November 06, 2001
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
G03F7/20; H01J37/302; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Mikio Hatta (4 outside)