ELECTRON BEAM LITHOGRAPHY SYSTEM AND PLOTTING METHOD USING ELECTRON BEAM

Japanese Patent JP3458778

B2

PROBLEM TO BE SOLVED: To prepare an area density map, without lowering the throughput of an electron beam lithography device by correcting the irradiation of an electron beam based on the roughness and fineness of pattern areas, by referring to a mesh which virtually divides a plotting region with the electron beam and a cumulative shot area density map, which is decomposed from a reference point at the boundary of the mesh based on the positional relation between shots.
SOLUTION: The position, shape data, etc., which are processed in the preceding state are read out from an input section 11. A shot area calculating circuit 1 calculates area values S0-S3 contained in a mesh through arithmetic processing and temporarily stores the calculated values S0-S3 in a partial memory 4. A switching circuit 2 selects the partial memory 4, in which the values S0-S3 are stored in an address number calculated by means of an address calculating circuit 10. The area values of the mesh, having the same address number, are read out from the memory 4 and is cumulatively added by an adder 3 while it accumulates data. A density converting section 5 converts the area values from the memory 4 into an area density and stores the converted density in a map memory 6. A calculating circuit 10 finds the addresses, where shots exist and calls out the value of the area density. An exposure converting circuit 8 and an arithmetic circuit 9 correct and output exposure, and conducts plotting.

Kawano Gen
Haruo Yoda
Masato Kamata
Minoru Wakita

JP21024299A

October 20, 2003

July 26, 1999

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株式会社日立製作所

H01L21/027; G03F7/20; (IPC1-7): H01L21/027; G03F7/20

JP11111595A
JP8227842A
JP6333796A

Yasuo Sakuta

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