To provide an electron beam vapor deposition system capable of depositing a vapor deposited film on the surface of a substrate under excellent efficiency and stability by monitoring the state of an electron beam emitted from a pierce type electron gun in a real time without interrupting the production during the driving of the system and feeding-back the result for improving or maintaining the state of the electron beam to the proper one, to provide a method for depositing a vapor deposited film onto the surface of a substrate performed using the system, to provide a pierce type electron gun capable of monitoring the state of a beam, and to provide a method for monitoring the state of a beam in a pierce type electron gun.
In the electron beam vapor deposition system provided with a pierce type electron gun, sensors for catching electrons sprung from or result from electron beams are installed in the vicinities of beam paths, and electric current and/or voltage based on the electrons caught by the sensors is detected, thus the state of the beam is monitored.
UCHIDA KAZUYA
| JP2003302499A | 2003-10-24 | |||
| JPH038251A | 1991-01-16 | |||
| JPH11335820A | 1999-12-07 | |||
| JPH0336268A | 1991-02-15 | |||
| JP2004014226A | 2004-01-15 | |||
| JP2000156187A | 2000-06-06 | |||
| JPH0297665A | 1990-04-10 | |||
| JP2004315971A | 2004-11-11 |
Shinichi Abe
Yuji Tsujida