Title:
ELECTRON MICROSCOPE
Document Type and Number:
Japanese Patent JP2002008577
Kind Code:
A
Abstract:
To achieve a high-speed sample replacement with an electron microscope for inspecting and observing silicon wafer for semiconductors.
A Z movement mechanism 4 is arranged inside a vacuum chamber 2, from which an already-observed sample 12 is moved sideways to take it out, and a standby sample 11 held by the Z movement mechanism 4 is moved downward and is placed on a sample stage 3. Also, an opening 21 for sending in a sample into the vacuum chamber 2 is separately provided above an opening 22 for taking out a sample. Further, a shield member 7 is provided between the Z movement mechanism 4 and the sample stage 3 free to move toward a sample-taking-out direction.
Inventors:
SEYA HIDEKAZU
MATSUMURA YASUHIDE
KUROSAKI TOSHISHIGE
AOKI KAZUO
MATSUMURA YASUHIDE
KUROSAKI TOSHISHIGE
AOKI KAZUO
Application Number:
JP2000194879A
Publication Date:
January 11, 2002
Filing Date:
June 23, 2000
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01J37/20; (IPC1-7): H01J37/20
Attorney, Agent or Firm:
Sakuta Yasuo