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Title:
ELECTRON SOURCE SUBSTRATE MANUFACTURING APPARATUS, ELECTRON SOURCE SUBSTRATE, AND IMAGE DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP3830459
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide an electron source substrate manufacturing apparatus which can stably manufacture a high-quality, accurate, and reliable electron source substrate having an electron emitter which is free from clogging during injection.
SOLUTION: The electron source substrate manufacturing apparatus injects droplets of a solution forming a conductive thin film 4 between element electrodes 2, 3 on a substrate 1 with a droplet injection head having a discharge port diameter of &phiv 25 μm or less, volatilizes a volatile component in a droplet pattern provided, and remains a solid component on the substrate 1 to form a group of surface conduction type electron emitters. The solution forming the conductive thin film 4 is a solution obtained by dispersing fine metal particles in liquid, and the fine metal particles have a size equal to or less than the surface coarse of a face forming a pattern. Assuming that the size of the fine metal particles is defined as Dp, and the discharge port diameter as Do, the equation 0.0001≤Dp/Do≤0.01 is established. Injection control is performed so that the thickness of the pattern is equal to or more than the surface coarse.


Inventors:
Takuro Sekiya
Application Number:
JP2003100247A
Publication Date:
October 04, 2006
Filing Date:
April 03, 2003
Export Citation:
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Assignee:
株式会社リコー
International Classes:
H01J9/02; H01J1/316; H01J29/04; H01J31/12; (IPC1-7): H01J9/02; H01J1/316; H01J29/04; H01J31/12
Domestic Patent References:
JP2001307622A
JP2000211124A
JP2002261437A
JP2122318U
Attorney, Agent or Firm:
Chieko Tateno