Title:
ELECTRONIC BEAM PLOTTER DEVICE
Document Type and Number:
Japanese Patent JP3245541
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve reflected electron acquirement efficiency, to increase the amount of reflected electronic current and to improve the S/N ratio of a reflected electronic current waveform, by providing a reflected electron detector so that it covers a whose except for the optical path of an optical axis center through which electron beams from an electron discharge element pass.
SOLUTION: In an electron beam plotter device, the electron discharge device 2 is provided with the plural electron discharge elements, a drawing electrode and a control electrode wiring structure for controlling the operation of the electron discharge elements. A substrate 1 is provided with an acceleration electrode 3 for accelerating electrons discharged from the electron discharge elements and a convergent electrode 4 for converging the accelerated electrons. Furthermore, a control means for electron discharge 10, a sample stand moving means 11 and a laser measure for sample stand position measurement 9 are provided. The refracted electron detector 5 is provided so that the whole except for the optical axis center through which the electron beams from the electron discharge elements of the electron discharge device 2 pass.
Inventors:
Naoaki Aisaki
Application Number:
JP1981397A
Publication Date:
January 15, 2002
Filing Date:
January 17, 1997
Export Citation:
Assignee:
NEC
International Classes:
G03F1/76; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F1/08; G03F7/20
Domestic Patent References:
| JP5275322A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)