Title:
エピタキシャルシリコンウェーハ及びその製造方法並びにエピタキシャル成長用シリコンウェーハ。
Document Type and Number:
Japanese Patent JP5250968
Kind Code:
B2
Inventors:
Yasuyuki Hashimoto
Ryo Nakashima
Ryo Nakashima
Application Number:
JP2006323680A
Publication Date:
July 31, 2013
Filing Date:
November 30, 2006
Export Citation:
Assignee:
Sumco inc.
International Classes:
H01L21/20; C23C16/24; C30B29/06; H01L21/205; H01L21/304
Domestic Patent References:
| JP6112120A | ||||
| JP2002231665A | ||||
| JP2005238444A | ||||
| JP2003285262A | ||||
| JP2003236735A | ||||
| JP2004223651A |
Attorney, Agent or Firm:
Masayoshi Suda