Title:
ETCHANT OF ALUMINUM FILM AND MANUFACTURING METHOD OF SUBSTRATE HAVING ALUMINUM FILM
Document Type and Number:
Japanese Patent JP2013149719
Kind Code:
A
Abstract:
To provide an etchant of an aluminum film capable of obtaining an aluminum film patterned in high shape accuracy.
The etchant of an aluminum film contains ferric chloride, hydrogen chloride, and water. The total amount of ferric chloride and hydrogen chloride in the etchant is 15 mass% to 39 mass%. A ratio (hydrogen chloride mass/ferric chloride mass) of hydrogen chloride mass to ferric chloride mass in the etchant is 1.5 to 15.5.
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Inventors:
MARUOKA HISAMITSU
Application Number:
JP2012007988A
Publication Date:
August 01, 2013
Filing Date:
January 18, 2012
Export Citation:
Assignee:
NIPPON ELECTRIC GLASS CO
International Classes:
H01L21/308; C23F1/20; H01L21/306
Attorney, Agent or Firm:
Patent business corporation Miya saki, table of contents patent office