Title:
エッチングレジスト組成物、およびこれを用いて得られた基材加工品
Document Type and Number:
Japanese Patent JP7462573
Kind Code:
B2
Abstract:
[Problem] To provide: a resist composition having excellent close adhesiveness, hydrofluoric acid resistance and detachability; and a processed substrate product produced using the resist composition. [Solution] Produced are: a hydrofluoric acid-resistant resist composition characterized by comprising (A) a carboxyl group-containing resin, (B) a polyfunctional (meth)acrylate monomer, (C) a polyfunctional thiol compound, (D) a photopolymerization initiator and (E) talc in an amount of 20 to 100 parts by mass relative to 100 parts by mass of the carboxyl group-containing resin (A); and a processed substrate product produced by an etching processing using the hydrofluoric acid-resistant resist composition.
Inventors:
Gen Takahashi
Kazunori Nishio
Kazunori Nishio
Application Number:
JP2020561556A
Publication Date:
April 05, 2024
Filing Date:
December 23, 2019
Export Citation:
Assignee:
Taiyo Holdings Co., Ltd.
International Classes:
G03F7/004; G03F7/027
Domestic Patent References:
| JP2007128052A | ||||
| JP2014074924A | ||||
| JP2014078045A | ||||
| JP2011164304A |
Attorney, Agent or Firm:
Toshiaki Eto
Akiko Kurawaki
Osamu Yamaguchi
Kenji Inagaki
Hironori Nagayama
Akiko Kurawaki
Osamu Yamaguchi
Kenji Inagaki
Hironori Nagayama