Title:
EXPOSING METHOD
Document Type and Number:
Japanese Patent JPH04215417
Kind Code:
A
Abstract:
PURPOSE: To provide an exposing method for obtaining better patterns which are hardly out of focus and to increase the manufacturing yield of LSIs.
CONSTITUTION: A device is so constituted that exposure may be done by causing to scan a reticle lighting region keeping the reticle stationary, using an exposing method by which the image of a pattern formed on a reticle is made by projection exposure on a substance to be exposed.
Inventors:
TANAKA HIROYUKI
Application Number:
JP40236790A
Publication Date:
August 06, 1992
Filing Date:
December 14, 1990
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G03F7/20; H01L21/027; H01L21/30; (IPC1-7): G03F7/20; H01L21/027
Attorney, Agent or Firm:
Gunichiro Ariga