To provide an exposure apparatus and an exposure method capable of reducing the cost of manufacturing a mask or the apparatus as a whole and achieving efficient exposure.
A proximity scanning exposure apparatus 1 includes: a substrate transfer mechanism 20, which supports a substrate W at least in an exposure region by floating and transfers the substrate W in a prescribed direction; a plurality of mask holding sections 71, which respectively hold a plurality of masks M whereupon patterns P are formed, and are arranged in a staggered manner along a direction intersecting the prescribed direction; and a plurality of irradiating sections 80, which are respectively arranged on upper portions of the mask holding sections 71 and irradiate the masks with exposure light. The substrate W being transferred in the prescribed direction is irradiated with exposure light EL through the plurality of masks M, and the patterns P of the masks M are transferred by exposure onto the substrate W.
HAYASHI SHINICHIRO
GOTO TEI
| JP2006235533A | 2006-09-07 | |||
| JP2007072267A | 2007-03-22 | |||
| JPS62102524A | 1987-05-13 |
Hironori Honda
Toshimitsu Ichikawa