Title:
露光データ作成方法
Document Type and Number:
Japanese Patent JP3999301
Kind Code:
B2
Abstract:
Producing an exposure data used for exposing a design pattern data of a semiconductor integrated circuit on an exposure medium. Repetitive exposure pattern data is extracted from the design pattern data as a group of exposure pattern data. The group of exposure pattern data includes plural pieces of the repetitive exposure pattern data. A rearrangement information table, which includes information for placing the plural pieces of repetitive exposure pattern data in a predetermined rearrangement area, is generated. The design pattern data is rearranged based on the rearrangement information table to generate the exposure data.
Inventors:
Masaaki Miyajima
Application Number:
JP5339697A
Publication Date:
October 31, 2007
Filing Date:
March 07, 1997
Export Citation:
Assignee:
富士通株式会社
International Classes:
G03F7/22; H01L21/027; G06F17/50; G06G7/66
Domestic Patent References:
| JP55143583A | ||||
| JP62269267A | ||||
| JP2012809A | ||||
| JP10149378A | ||||
| JP54055382A |
Attorney, Agent or Firm:
Hironobu Onda