Title:
露光装置及び洗浄方法
Document Type and Number:
Japanese Patent JP4510433
Kind Code:
B2
Abstract:
An exposing method which can effect the cleaning of an optical element so that throughput may not be substantially reduced when exposure using ultraviolet light is effected. The exposing method applies ultraviolet light emitted from a light source to an object to be exposed through a first isolated chamber including an optical surface, and a second isolated chamber including an optical surface to thereby expose the object to be exposed by the light. The method includes a first cleaning step of supplying a cleaning gas to the first isolated chamber to thereby clean the optical surface included in the first isolated chamber, and a second cleaning step of supplying a cleaning gas to the second isolated chamber to thereby clean the optical surface included in the second isolated chamber, wherein the start of the first cleaning step is later than the start of the second cleaning step.
Inventors:
Tomoharu Hase
Application Number:
JP2003403948A
Publication Date:
July 21, 2010
Filing Date:
December 03, 2003
Export Citation:
Assignee:
Canon Inc
International Classes:
G02B7/02; B08B7/00; H01L21/027; G03B27/52; H01L21/304
Domestic Patent References:
| JP2001060548A | ||||
| JP2000323396A | ||||
| JP2001345265A | ||||
| JP2002164267A |
Foreign References:
| WO2000041225A1 |
Attorney, Agent or Firm:
Ryosuke Fujimoto