Title:
露光装置および露光方法
Document Type and Number:
Japanese Patent JP7221934
Kind Code:
B2
Abstract:
An exposure apparatus and method. The exposure apparatus includes a control system, light source system, plurality of illumination systems and plurality of projection objective lenses. The light source system is configured to emit a plurality of first illumination beams incident on the illumination systems. Each illumination system includes a variable attenuator and branch energy detector. The branch energy detector is configured to detect an illuminance level of a second illumination beam generated in the corresponding illumination system and feed it back to the control system. The control system is configured to adjust the illuminance levels of the second illumination beams in the respective illumination systems by controlling the respective variable attenuators therein. The exposure apparatus and method have improved exposure performance and allow finer and faster energy adjustments, thus enabling precise control and higher exposure accuracy.
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Inventors:
Chien Jun
Jai Suhong
Jai Suhong
Application Number:
JP2020507095A
Publication Date:
February 14, 2023
Filing Date:
August 09, 2018
Export Citation:
Assignee:
Shanghai Microelectronics Equipment (Group) Company Limited
International Classes:
G03F7/20
Domestic Patent References:
| JP2005026511A | ||||
| JP61116319U | ||||
| JP9320932A | ||||
| JP11023365A | ||||
| JP2004327660A | ||||
| JP8139009A | ||||
| JP2006343684A | ||||
| JP2001237169A | ||||
| JP11504443A | ||||
| JP2003203853A | ||||
| JP2003295459A |
Attorney, Agent or Firm:
Ken Ieiri