Title:
EXPOSURE MASK AND PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JPH05107736
Kind Code:
A
Abstract:
PURPOSE: To provide an exposure mask fit for various patterns.
CONSTITUTION: A transparent film 2 is deposited on a transparent substrate 1 and part of the film 2 is patterned to form a phase shift pattern 2a. Light shielding films are then deposited on the substrate 1 and/or the film 2 and patterned to form light shielding film patterns 3, 4. An exposure mask with the phase shift pattern 2a and the light shielding film patterns 3, 4 independent is produced.
Inventors:
HIGASHIYA MASAAKI
Application Number:
JP27146691A
Publication Date:
April 30, 1993
Filing Date:
October 18, 1991
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G03F1/34; G03F1/68; H01L21/027; H01L21/30; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Teiichi