Title:
EXPOSURE RECORDING APPARATUS
Document Type and Number:
Japanese Patent JP2002131675
Kind Code:
A
Abstract:
To obtain high-quality images free of unevenness by easily regulating the widths to a sub scanning direction of the respective light beams outputted from respective light sources arrayed in the sub-scanning direction with high accuracy.
The near field patterns of the laser beams L outputted from semiconductor lasers 18 are imaged to apertures 24 through collimator lenses 20 and cylindrical lenses 22 and the widths thereof to the sub-scanning direction (arrow Y direction) are regulated by the turning angles of the apertures 24. The laser beams L regulated in the widths are guided through the cylindrical lenses 26 and imaging lenses 28 to a recording film F and the beam spots consisting of the desired recording widths are formed.
Inventors:
MIYAGAWA ICHIRO
Application Number:
JP2000326944A
Publication Date:
May 09, 2002
Filing Date:
October 26, 2000
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
B41J2/44; G02B26/10; H01S5/40; H04N1/06; H04N1/113; (IPC1-7): G02B26/10; B41J2/44; H01S5/40; H04N1/06; H04N1/113
Attorney, Agent or Firm:
Takehiro Chiba (1 outside)