Title:
極端紫外光源装置
Document Type and Number:
Japanese Patent JP5358060
Kind Code:
B2
Abstract:
An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
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Inventors:
Hoshino Hideyuki
Abe Tamotsu
Akira Endo
Abe Tamotsu
Akira Endo
Application Number:
JP2007039811A
Publication Date:
December 04, 2013
Filing Date:
February 20, 2007
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H05G2/00; G03F7/20; G21K5/08; H01L21/027
Domestic Patent References:
| JP2002122543A | ||||
| JP2007005412A | ||||
| JP1158333A | ||||
| JP2006228998A | ||||
| JP2003270551A | ||||
| JP2118621A | ||||
| JP8213192A | ||||
| JP5506748A |
Foreign References:
| WO2005029191A2 |
Attorney, Agent or Firm:
Masaaki Utsunomiya
Atsushi Watanabe
Mutsumi Yanase
Atsushi Watanabe
Mutsumi Yanase