EXTREME ULTRAVIOLET OPTICAL SOURCE EQUIPMENT

Title:

EXTREME ULTRAVIOLET OPTICAL SOURCE EQUIPMENT

Document Type and Number:

Japanese Patent JP2006080255

Kind Code:

A

Abstract:

To provide EUV optical source equipment in which a condensing mirror is protected from debris which is said to be harmful for mirror coating.

The optical equipment generates extreme ultraviolet ray by irradiating a target with laser beam. It comprises a chamber 100 for generation of extreme ultraviolet ray, a target jetting device 120 and target jetting nozzle 121 which supply a material to be a target in the chamber, a laser light source 110 for generating plasma by radiating the target with laser beam, a condensing mirror 102 for condensing the extreme ultraviolet ray emitted from plasma, an X-ray source 132 to provide charge particles by ionizing neutral particles contained in the particles emitted from the plasma, and magnets 130 and 131 for forming a magnetic field in the chamber to trap at least the neutral particles ionized by the X-ray source.

Inventors:

IMAI YOSUKE
HOSHINO HIDEYUKI
KOMORI HIROSHI

Application Number:

JP2004261871A

Publication Date:

March 23, 2006

Filing Date:

September 09, 2004

Export Citation:

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Assignee:

KOMATSU MFG CO LTD
GIGAPHOTON INC

International Classes:

H01L21/027; G03F7/20; G21K5/00; G21K5/02; H05G2/00; H05H1/24

Domestic Patent References:

JP2004207736A	2004-07-22
JP2003142296A	2003-05-16
JPH09245992A	1997-09-19
JP2002313597A	2002-10-25
JPH0817371A	1996-01-19
JPH10221499A	1998-08-21
JPH01265443A	1989-10-23
JPH10223395A	1998-08-21
JP2007522646A	2007-08-09

Attorney, Agent or Firm:

Masaaki Utsunomiya
Atsushi Watanabe
Mutsumi Yanase

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