Title:
FABRICATION OF MICROMECHANISM DEVICE
Document Type and Number:
Japanese Patent JPH09205075
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To avoid a sticking effect by making an opening in an intermediate layer and forming an auxiliary structure for coupling a movable structure with a support in the opening and the removing the intermediate 'layer around the movable structure before removing the auxiliary structure. SOLUTION: An opening 6 for exposing a movable structure 3 and supports 1, 4 is made in an intermediate layer 2 and then the opening 6 is filled with a photoresist layer 7 to form an auxiliary structure 7a for coupling the movable structure 3 with the supports 1, 4. The photoresist layer 7 having an opening exposing the movable structure 3 is constructed into a mask and the intermediate layer 2 around the movable structure 3 is removed through the opening by etching process before removing the auxiliary structure 7a by a dry etching process. According to the method, the sticking effect can be avoided.
Inventors:
UORUFUGANGU UERUNAA
Application Number:
JP1009397A
Publication Date:
August 05, 1997
Filing Date:
January 06, 1997
Export Citation:
Assignee:
SIEMENS AG
International Classes:
H01L21/302; B81B3/00; B81C1/00; G01P15/08; H01L21/306; H01L49/00; (IPC1-7): H01L21/306; H01L21/302; H01L49/00
Attorney, Agent or Firm:
Tomimura Kiyoshi
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