Title:
成膜方法
Document Type and Number:
Japanese Patent JP7452238
Kind Code:
B2
Abstract:
To provide a cold spray type film deposition method capable of reducing a replacement or cleaning frequency of a mask member by suppressing a deposition of a raw material powder to a specific place as a coating.SOLUTION: A turn around point TP1 where a relative speed of a cylinder head crude material 3 and a nozzle 23d becomes lower is set on a masking member 5 where is also on a connection trajectory CT1. In a masking type film deposition method where a coating is formed by continuously ejecting a raw material powder by a cold spray method, when a film deposition treatment is performed for multiple cylinder head crude material, the turning around point TP1b that is set on the masking member for the cylinder head crude member is set to a position different from TP1a that is set for the cylinder head crude material of a previous time.SELECTED DRAWING: Figure 17
Inventors:
Tsunekichi Kamada
Hirohisa Shibayama
Hidenobu Matsuyama
Naoya Tainaka
Noshi Ryoji
Toshio Ogiya
Haruhiko Suzuki
Hirohisa Shibayama
Hidenobu Matsuyama
Naoya Tainaka
Noshi Ryoji
Toshio Ogiya
Haruhiko Suzuki
Application Number:
JP2020086621A
Publication Date:
March 19, 2024
Filing Date:
May 18, 2020
Export Citation:
Assignee:
Nissan Motor Co., Ltd
International Classes:
C23C24/04; B05D1/12; B05D1/32; B05D3/00; F01L3/02; F01L3/24; F02F1/00; F02F1/24
Domestic Patent References:
| JP2018197370A | ||||
| JP2006032485A | ||||
| JP2018012875A |
Foreign References:
| WO2020202304A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Tokoshie Patent Office
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