Title:
基板処理装置用フィルタ装置及び清浄空気供給方法。
Document Type and Number:
Japanese Patent JP7241650
Kind Code:
B2
Abstract:
The present invention uniformizes temperature of clean air supplied to a plurality of substrate processing devices arranged in parallel via a filter. The present invention relates to a filter device having the filter installed above the plurality of substrate processing devices arranged in parallel. The filter device is configured such that an air inlet is formed at one end side in the parallel direction of each substrate processing device in a duct space formed above the filter, and air introduced from the air inlet is guided from the front side of an air flow guide member to the other end side of the duct space by the air flow guide member which partitions the duct space in the vertical direction, and at least a part of the air guided to the other end side returns to the back side of the air flow guide member. In addition, the filter device is configured such that the air in the duct space flows to the substrate processing device via the filter.
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Inventors:
Naoki Tajima
Takeshi Tobimatsu
Takeshi Tobimatsu
Application Number:
JP2019166580A
Publication Date:
March 17, 2023
Filing Date:
September 12, 2019
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027
Domestic Patent References:
| JP2010087115A | ||||
| JP3171198U | ||||
| JP2012156488A |
Foreign References:
| US20030108349 | ||||
| US20130160261 |
Attorney, Agent or Firm:
Kanemoto Tetsuo
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine
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