Title:
FINE HOLE TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP3737467
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a device in which a slurry additive in a slurry tank is prevented from being diffused and migrating out of the slurry tank during continuous processing operation for a long time, a distributing state of the slurry additive is stabilized, variation in the amount of the slurry additive acting on surface treatment of a fine through-hole in an axial direction is prevented, and quality of the surface treatment is stable.
SOLUTION: The slurry tank 5 is partitioned into a lower layer part 18 containing slurry 8 made by adding abrasive grains to solvent and a pressurized chamber 17 to which pressurized fluid 7 is led, by a partition plate 2 connected with one end of a return spring 9, the other end of which is connected with a top lid of the slurry tank 5. The pressurized fluid 7 is led from a fluid pressure supply device to the pressurized chamber 17 of the slurry thank 5 through piping 15, and the lower layer part 18 of the slurry tank 5 containing the slurry 8 is connected to a pair of work holding tools 3a, 3b through piping 16.
Inventors:
Matsushima Kazuaki
Kiyoto Toshiyuki
Takashi Kawakami
Kiyoto Toshiyuki
Takashi Kawakami
Application Number:
JP2002281526A
Publication Date:
January 18, 2006
Filing Date:
September 26, 2002
Export Citation:
Assignee:
Fujikoshi Co., Ltd.
International Classes:
B24B5/48; B24B31/00; B24B37/00; B24B57/02; (IPC1-7): B24B37/00; B24B31/00; B24B57/02; //B24B5/48
Domestic Patent References:
| JP49091896U | ||||
| JP54121394U | ||||
| JP2003300148A | ||||
| JP2002355746A | ||||
| JP7052022A |
Attorney, Agent or Firm:
Junji Kawachi