To provide a fine particle film-forming apparatus which can use fine particles for film formation as they are, can form a film safely without giving physical or chemical damage during the film formation, does not require a patterning or etching process necessary before or after the formation of a fine particle film, and can form a fine particle film that has the given distribution of the film thickness in a short time over a wide range.

The fine particle film-forming apparatus includes: a mask structure 1 which is spread above a film formation substrate and has two or more openings 5a through which fine particles pass bored in a given arrangement; a frame substrate 10 that encloses the mask structure 1; a lid substrate which is superposed on the frame substrate 10 and has a window formed to supply the fine particles only to a given region corresponding to the mask structure 1 so that the fine particles distribute in a prescribed amount; and an actuator 3 that enables the mask structure 1 to reciprocate from the frame substrate 10 to sift the fine particles through the opening 5a to deposit on the film formation substrate.