Title:
炎光穿孔された開口マスク
Document Type and Number:
Japanese Patent JP2009521714
Kind Code:
A
Abstract:
An aperture mask is provided comprising an elongated web of flexible film having at least one deposition mask pattern formed in the film, wherein the deposition mask pattern defines deposition apertures that extend through the film that define at least a portion of one or more electronic circuit elements, and wherein deposition apertures are bounded by a rim, the rim being a portion of the mask which has a thickness greater than an average thickness for the mask. In another aspect, the present invention provides a method of making such an aperture mask comprising the steps of: providing a support surface, wherein the support surface includes a plurality of lowered portions; providing a burner, wherein the burner supports a flame, and wherein the flame includes a flame tip opposite the burner; contacting at least a portion of an elongated web of flexible film against the support surface; and heating the film with a flame from a burner to create apertures in the film in the areas covering the plurality of lowered portions.
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Inventors:
Nichols, Jonathan A.
Tokey, Jeffrey H.
Bench, Michael W.
Strobel, Mark A.
Getchel, Joel A.
McClure, Donald Jay.
Tokey, Jeffrey H.
Bench, Michael W.
Strobel, Mark A.
Getchel, Joel A.
McClure, Donald Jay.
Application Number:
JP2008547267A
Publication Date:
June 04, 2009
Filing Date:
December 05, 2006
Export Citation:
Assignee:
3M INNOVATIVE PROPERTIES COMPANY
International Classes:
C23C14/04; C23C14/56; G03F1/92
Attorney, Agent or Firm:
Atsushi Aoki
Jun Tsuruta
Tetsuro Shimada
Kazuo Maejima
Hirose Shigeki
Yoshimitsu Mizumoto
Jun Tsuruta
Tetsuro Shimada
Kazuo Maejima
Hirose Shigeki
Yoshimitsu Mizumoto