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Patent Searching and Data


Title:
FLUID POLISHING METHOD AND DEVICE
Document Type and Number:
Japanese Patent JP2007061932
Kind Code:
A
Abstract:

To improve working accuracy of a microhole by avoiding the occurrence of cylinder switching in the process of fluid polishing, and by preventing separation of slurry and deposition of abrasive grains in the cylinder.

In the fluid polishing method for machining a microhole by slurry 7, in the slurry flow target machining process, when slurry is supplied from the cylinder 2a until it is increased to an target value of a predetermined slurry supply flow rate to reach the target value, the cylinder is stopped and it is switched to another cylinder 2b. After that, the working fluid flow rate of the microhole is measured. In the next metering machining process to be performed, the required machining time is calculated, based upon the working fluid flow rate, and polishing is performed by another cylinder 2b for the required machining time. The cylinder is stopped and switched to measure the working fluid flow rate. The metering machining process is repeated until the working fluid flow rate reaches a predetermined value.


Inventors:
OOKA YASUHITO
KATO SHINICHI
KIMURA KAZUNARI
Application Number:
JP2005249256A
Publication Date:
March 15, 2007
Filing Date:
August 30, 2005
Export Citation:
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Assignee:
DENSO CORP
International Classes:
B24B31/00
Attorney, Agent or Firm:
Atsushi Aoki
Jun Tsuruta
Tetsuro Shimada
Shinozaki Masami
Masaya Nishiyama