Title:
ヒドロキシル基またはフルオロアルキルカルボニル基含有含フッ素エチレン性単量体
Document Type and Number:
Japanese Patent JP4935763
Kind Code:
B2
Abstract:
There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): and the formula ( 14): respectively, wherein X<1> and X<2> are the same or different and each is H or F; X<3> is H, F, Cl or CF3; Rf<1> and Rf<2> are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf<3> is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.
Inventors:
Takayuki Araki
Yuzo Komatsu
High light sky
Yuzo Komatsu
High light sky
Application Number:
JP2008149306A
Publication Date:
May 23, 2012
Filing Date:
June 06, 2008
Export Citation:
Assignee:
Daikin Industries, Ltd.
International Classes:
C08F16/26; C07C33/42; C07C43/178; C07C45/45; C07C49/227; C07C49/255; C08F16/04; C08F16/34; C08F216/04; G03F7/004; G03F7/038; G03F7/039; G03F7/09
Domestic Patent References:
| JP5238988A | ||||
| JP2002090996A |
Foreign References:
| US3414549 | ||||
| US3391119 |
Attorney, Agent or Firm:
Kawamura Taku
Yousuke Fujimori
Seiji Tani
Yousuke Fujimori
Seiji Tani