Title:
FLUORINE-CONTAINING SULFONATE RESIN, FLUORINE-CONTAINING N-SULFONYLOXYIMIDE RESIN, RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2013227466
Kind Code:
A
Abstract:
To provide a resist resin having a sulfonic acid onium salt or a fluorine-containing N-sulfonyloxyimide compound integrated in a side chain, containing an anion fixed to a resin side, and having a wide DOF, small LER, high sensitivity and high resolution.
There are provided a fluorine-containing sulfonate resin and a fluorine-containing sulfonic acid ester resin having a structure expressed by the general formula (in the formula, X groups are each independently a hydrogen atom or fluorine atom; n is an integer of 1-10; R is a hydrogen atom, halogen atom, 1-3C alkyl or fluorine-containing alkyl; J is a divalent linker; and (a) is 0 or 1).
Inventors:
KATO MISUGI
ISONO YOSHIMI
TAKIBANA RYOZO
MORI KAZUKI
NARIZUKA SATOSHI
ISONO YOSHIMI
TAKIBANA RYOZO
MORI KAZUKI
NARIZUKA SATOSHI
Application Number:
JP2012128859A
Publication Date:
November 07, 2013
Filing Date:
June 06, 2012
Export Citation:
Assignee:
CENTRAL GLASS CO LTD
International Classes:
C08F20/38; C07D207/46; C07D209/48; C09K3/00; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| JP2013225126A | 2013-10-31 | |||
| JP2013113915A | 2013-06-10 | |||
| JP2010095643A | 2010-04-30 | |||
| JP2009007327A | 2009-01-15 | |||
| JP2012173417A | 2012-09-10 |
Attorney, Agent or Firm:
Yoshiyuki Nishi
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