FLUX CLEANING COMPOSITION - ASAHI CHEM RES LAB

Title:

FLUX CLEANING COMPOSITION

Document Type and Number:

Japanese Patent JPH03149299

Kind Code:

A

Abstract:

PURPOSE: To eliminate an adverse effect on a soldered resist and to improve the detergency by incorporating a strongly basic substance and a water-soluble amine into a flux cleaning agent.

CONSTITUTION: A flux cleaning agent comprising a rosin is mixed with 0.01-5wt.% strongly basic substance containing an inorganic alkali salt, a quaternary ammonium hydroxide, and a diaza-bicyclo compound (e.g. caustic soda) and 0.1-50wt.% water-soluble amine containing an aliphatic alkylamine or alkanolamine (e.g. monoethanolamine).

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Inventors:

HIRAGA KAZUHITO
OU KINBUN
OBA YOICHI
MOROOKA ISAO
IWASA SANDAI

Application Number:

JP28673389A

Publication Date:

June 25, 1991

Filing Date:

November 02, 1989

Export Citation:

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Assignee:

ASAHI CHEM RES LAB

International Classes:

C11D7/60; C11D7/06; H05K3/26; (IPC1-7): C11D7/60; H05K3/26

Attorney, Agent or Firm:

Kume Eiichi

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