To provide a method for forming an amorphous thin film substantially maintaining the chemical structure of an org. optical function material on a substrate without using a large-scale apparatus.
This amorphous thin film forming method for the org. optical function material is a method of forming the thin film by irradiating a target consisting of a low molecular org. compd. having an optical function with a UV light laser 3 to vaporize the low molecular org. compd. and depositing the vaporized low molecular org. compd. on a substrate 11, in which the irradiation intensity E (mJ/cm2) of the UV laser satisfies the conditions: C×1.5≤E≤C×4 (where, C: the irradiation intensity E (mJ/cm2) of the UV light laser at which the vaporized low molecular org. compd. substantially begins to be deposited.
YANO TETSUO
YONEDA MICHIFUMI
KATSUMURA MUNEHIDE
KAJITANI TAKAHIRO
TANAKA OSAMU
TANGE YOSHIHIRO
MATSUDA HIDEAKI
AGENCY IND SCIENCE TECHN
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