To make a required space small and permit the reduction of a cost.

At first, a part except a pattern forming region is made repellent to liquid through the liquid repellent treatment 10 of a glass substrate. The liquid repellent treatment 10 consists of a liquid repellent film forming process 10a for forming a liquid repellent film on the glass substrate, and a patterning process 10b for patterning the liquid repellent film. Next, a solution applying process 12 is effected in non-oxidizing atmosphere to apply a solution obtained by dispersing the powder of amorphous silicon into a solvent on the pattern forming region of the glass substrate. Thereafter, a drying process 14 is effected in the non-oxidizing atmosphere and the solution is dried to form an amorphous silicon film. Subsequently, an annealing process 16 is effected in the non-oxidizing atmosphere to irradiate laser against the amorphous silicon film and obtain a polysilicon film by heating the amorphous silicon film.