Title:
フォトマスク用ガラス基板及びその製造方法
Document Type and Number:
Japanese Patent JP3627805
Kind Code:
B2
Abstract:
A glass substrate is to be used as a photomask having a patterned light-shielding film on a surface thereof and thus exposed to light. The substrate is leveled by local plasma etching such that an exposure surface may have a flatness of 0.04-2.2 nm/cm<2>. Since the glass substrate is configured such that the exposure surface or hold surface of the resulting photomask is fully flat during the exposure step, it is suited for use as silica glass substrates for photomasks used in the photolithography of great interest in the fabrication of ICs, thus contributing to the achievement of finer patterns in the semiconductor field.
Inventors:
Masaki Takeuchi
Yukio Shibano
Yukio Shibano
Application Number:
JP2001122397A
Publication Date:
March 09, 2005
Filing Date:
April 20, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C03C15/00; C03C15/02; G03F1/60; H01L21/027; (IPC1-7): G03F1/14; C03C15/00; H01L21/027
Domestic Patent References:
| JP5241322A | ||||
| JP10273788A | ||||
| JP5036590A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa