HALFTONE PHASE SHIFT MASK AND HALFTONE PHASE SHIFT MASK BLANK

Title:

HALFTONE PHASE SHIFT MASK AND HALFTONE PHASE SHIFT MASK BLANK

Document Type and Number:

Japanese Patent JP3441711

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a halftone phase shift mask capable of nearly perfectly preventing the leakage of light for exposure by a simple structure while making good use of its original advantages and a halftone phase shift mask blank as the material of the halftone phase shift mask.
SOLUTION: In a halftone phase shift mask blank with a translucent film 5 comprising a monolayer film which transmits light having such intensity as not to contribute to exposure and shifts the phase of the transmitted light on a transparent substrate 1, a light shielding film 7 comprising a material having resistance to an atmosphere in which the constituent material of the translucent film 5 is etched is disposed on the translucent film 5.

Inventors:

Yasushi Ohkubo

Application Number:

JP2000335719A

Publication Date:

September 02, 2003

Filing Date:

November 02, 1993

Export Citation:

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