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Title:
HIGH-PURITY TRIALKYLGALLIUM AND ITS PREPARATION METHOD
Document Type and Number:
Japanese Patent JP2008081451
Kind Code:
A
Abstract:

To provide a high-purity trialkylgallium through a simple method, and the method thereof.

Trialkylgallium (wherein the alkyl group contains 1-6 carbons) is reacted with a trialkylamine to form a complex, the complex is purified through distillation, and the trialkylamine is dissociated to recover the free trialkylgallium. This yields the high-purity trialkylgallium having a silicon atom content of 0.1 mass ppm.


Inventors:
NOGUCHI HIDETAKA (JP)
ISHICHI KOJI (JP)
MONOBE HIROYUKI (JP)
HIRATSUKA TORU (JP)
MATSUSHIGE KENJI (JP)
Application Number:
JP2006264110A
Publication Date:
April 10, 2008
Filing Date:
September 28, 2006
Export Citation:
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Assignee:
UBE INDUSTRIES (JP)
International Classes:
C07F5/00
Domestic Patent References:
JPS62185090A1987-08-13
JPS4974199A1974-07-17
JP2005008552A2005-01-13
JP2006111546A2006-04-27
JP2005008552A2005-01-13
JPS62185090A1987-08-13
JP2008050268A2008-03-06
Foreign References:
GB2201418B1990-10-24



 
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