Title:
HIGH-PURITY TRIALKYLGALLIUM AND ITS PREPARATION METHOD
Document Type and Number:
Japanese Patent JP2008081451
Kind Code:
A
Abstract:
To provide a high-purity trialkylgallium through a simple method, and the method thereof.
Trialkylgallium (wherein the alkyl group contains 1-6 carbons) is reacted with a trialkylamine to form a complex, the complex is purified through distillation, and the trialkylamine is dissociated to recover the free trialkylgallium. This yields the high-purity trialkylgallium having a silicon atom content of 0.1 mass ppm.
Inventors:
NOGUCHI HIDETAKA (JP)
ISHICHI KOJI (JP)
MONOBE HIROYUKI (JP)
HIRATSUKA TORU (JP)
MATSUSHIGE KENJI (JP)
ISHICHI KOJI (JP)
MONOBE HIROYUKI (JP)
HIRATSUKA TORU (JP)
MATSUSHIGE KENJI (JP)
Application Number:
JP2006264110A
Publication Date:
April 10, 2008
Filing Date:
September 28, 2006
Export Citation:
Assignee:
UBE INDUSTRIES (JP)
International Classes:
C07F5/00
Domestic Patent References:
JPS62185090A | 1987-08-13 | |||
JPS4974199A | 1974-07-17 | |||
JP2005008552A | 2005-01-13 | |||
JP2006111546A | 2006-04-27 | |||
JP2005008552A | 2005-01-13 | |||
JPS62185090A | 1987-08-13 | |||
JP2008050268A | 2008-03-06 |
Foreign References:
GB2201418B | 1990-10-24 |