Title:
再湿潤可能な非対称な膜の形成方法
Document Type and Number:
Japanese Patent JP2011526830
Kind Code:
A
Abstract:
The present disclosure provides rewettable asymmetric membranes and methods of forming rewettable asymmetric membranes. More specifically, methods are provided for forming rewettable asymmetric membranes having a copolymer and a polymerized material retained within the porous substrate.
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| JP5214857 | Porous substrate |
Inventors:
Butterfly, jin shen
Hester, Jonathan F.
Dane, Derek Jay.
Meehan, Daniel Pee.
Light, robin e.
Hester, Jonathan F.
Dane, Derek Jay.
Meehan, Daniel Pee.
Light, robin e.
Application Number:
JP2011516368A
Publication Date:
October 20, 2011
Filing Date:
May 13, 2009
Export Citation:
Assignee:
3M INNOVATIVE PROPERTIES COMPANY
International Classes:
B01D69/02; B01D69/10; B01D69/12; B01D71/02; B01D71/12; B01D71/26; B01D71/28; B01D71/30; B01D71/32; B01D71/38; B01D71/40; B01D71/42; B01D71/56; B01D71/64; B01D71/68; B01D71/82
Domestic Patent References:
| JP2004534647A | 2004-11-18 | |||
| JP2004307840A | 2004-11-04 | |||
| JPH0751550A | 1995-02-28 | |||
| JP2003504190A | 2003-02-04 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Yoshihiro Kobayashi
Masaharu Konoue
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Yoshihiro Kobayashi
Masaharu Konoue