Title:
ホイルへの凹部パターンの提供方法
Document Type and Number:
Japanese Patent JP2004504180
Kind Code:
A
Abstract:
The invention relates to a method for providing in a foil a number of recesses which are arranged relative to each other in a recess pattern extending along a first side of the foil, each recess extending from a first side in the direction of an opposite, second side of the foil, the method comprising at least the following steps: (a) applying a medium pattern onto the unprocessed foil, the medium comprising a medium solvable in solvent, the medium pattern corresponding to the recess pattern to be provided; (b) applying the masking layer onto the foil; (c) bringing the foil, with the masking layer applied thereto, into contact with a solvent, whereby the parts of the masking layer applied substantially on the medium pattern are removed from the foil upon dissolution of the medium pattern; and (d) at least partly exposing the foil with the pattern of openings to a foil etching environment, whereby the recess pattern is created, characterized in that in step (a) the application of a medium pattern is executed with the aid of a printing technique.
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Inventors:
Hayel, Jacob
Had Zio Oanau, Heorges
Had Zio Oanau, Heorges
Application Number:
JP2002511975A
Publication Date:
February 12, 2004
Filing Date:
July 16, 2001
Export Citation:
Assignee:
ZETFOLIE B.V.
International Classes:
B01F1/00; B41M3/00; B41M5/00; H01L21/027; B41J2/00; (IPC1-7): B41M5/00; B01F1/00; H01L21/027
Attorney, Agent or Firm:
Keiichiro Saikyo
Takeshi Sugiyama
Minetarou Hirose
Takeshi Sugiyama
Minetarou Hirose