疎水性シリカ粒子およびその製造方法

Title:

疎水性シリカ粒子およびその製造方法

Document Type and Number:

Japanese Patent JP5732524

Kind Code:

B2

Abstract:

Hydrophobic silica particles are produced by reacting them with a hydrosiloxane agent.

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Inventors:

Allison M. Christopher
George Dee Aid
Joachim K. Froes
Dmitry Fomitschev
Jin Chen

Application Number:

JP2013503739A

Publication Date:

June 10, 2015

Filing Date:

April 01, 2011

Export Citation:

Assignee:

CABOT CORPORATION

International Classes:

C01B33/149; G03G9/08

Domestic Patent References:

Attorney, Agent or Firm:

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Satoshi Deno
Nagasaka Tomoyasu

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