Title:
HYDROXYCARBORANE PHOTORESIST AND METHOD FOR USING THE SAME IN TWO-LAYER THIN FILM IMAGING LITHOGRAPHY
Document Type and Number:
Japanese Patent JP3443099
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition which is transparent in the wavelength range of UV to a shorter wave and can utilize oxygen reactive ion etching using an additive in place of phenols.
SOLUTION: The photoresist composition contains a polymer having an acid labile group, hydroxycarborane and a photo-acid generating agent. When the composition is used as an upper layered resist for two-layer thin film imaging lithography, the resist has superior transmittance to an illuminant of a wavelength in the extreme-ultraviolet region and has superior workability in the production of a semiconductor device.
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Inventors:
Donald Sea Hofer
Scott A McDonald
Alpin Pee Mahaluwala
Robert Dee Miller
Joseph Mitchell
Gregory M Wallraf
Scott A McDonald
Alpin Pee Mahaluwala
Robert Dee Miller
Joseph Mitchell
Gregory M Wallraf
Application Number:
JP2001039108A
Publication Date:
September 02, 2003
Filing Date:
February 15, 2001
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C08K5/55; C08L25/04; C08L33/12; C08L101/02; G03F7/004; G03F7/039; G03F7/26; H01L21/027; (IPC1-7): G03F7/004; C08K5/55; C08L25/04; C08L33/12; C08L101/02; G03F7/039; G03F7/26; H01L21/027
Domestic Patent References:
| JP5224421A | ||||
| JP61226747A |
Attorney, Agent or Firm:
Hiroshi Sakaguchi (1 person outside)
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