【発明の名称】酸素濃度の均一なシリコンウェーハ及びその製造方法

Title:

【発明の名称】酸素濃度の均一なシリコンウェーハ及びその製造方法

Document Type and Number:

Japanese Patent JP2881759

Kind Code:

B2

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Inventors:

IINO EIICHI
TAKANO KYOTAKA
FUSEGAWA IZUMI
YAMAGISHI HIROTOSHI

Application Number:

JP33677093A

Publication Date:

April 12, 1999

Filing Date:

December 28, 1993

Export Citation:

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Assignee:

SHINETSU HANDOTAI KK

International Classes:

C30B15/00; C30B29/06; C30B33/02; H01L21/02; H01L21/208; H01L21/322; H01L21/324; (IPC1-7): C30B33/02; C30B15/00; C30B29/06; H01L21/02; H01L21/208; H01L21/324

Domestic Patent References:

JP597568A
JP6316483A

Attorney, Agent or Firm:

Ryoichi Yamamoto (1 person outside)

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