Title:
【発明の名称】安定なアイオノマーフォトレジスト用エマルジョンおよびそれの製造方法および使用
Document Type and Number:
Japanese Patent JP3498147
Kind Code:
B2
Abstract:
Disclosed are waterborne, stable photoresist compositions and methods of their preparation and use. The compositions are characterized by increased shear and storage stability. The photoresist composition comprises an aqueous emulsion of a 22% or less neutralized carboxylated resin and non-ionic surfactant containing poly(ethylene-oxide) segments, photopolymerizable monomer and photoinitiator. Neutralization is accomplished using either an organic or an inorganic base or mixtures thereof. The photoresist compositions are useful to selectively coat and protect surfaces subjected to corrosive environments, e.g., etchant processes, in the production of circuit traces for electronic circuit boards.
Inventors:
Harotsk, Jiyoung Scott
Beckner, Alan Frederick
Ebner, Cynthia Louise
Heart, daniel joseph
Beckner, Alan Frederick
Ebner, Cynthia Louise
Heart, daniel joseph
Application Number:
JP52348795A
Publication Date:
February 16, 2004
Filing Date:
February 24, 1995
Export Citation:
Assignee:
MacDermid Incorporated
International Classes:
C09D4/00; C09D4/02; C09D4/06; G03F7/004; G03F7/027; G03F7/031; G03F7/033; H05K3/00; H05K3/06; H05K3/18; (IPC1-7): G03F7/033; C09D4/06; G03F7/004; G03F7/027; G03F7/031; H05K3/00; H05K3/06; H05K3/18
Domestic Patent References:
| JP7219222A | ||||
| JP6287486A | ||||
| JP784369A | ||||
| JP635187A |
Attorney, Agent or Firm:
Heiyoshi Odashima (1 person outside)
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