IN-LINE WAFER CARRIAGE SYSTEM - OKAMOTO MACHINE TOOL WORKS

Title:

IN-LINE WAFER CARRIAGE SYSTEM

Document Type and Number:

Japanese Patent JP2002151450

Kind Code:

A

Abstract:

To provide an in-line wafer carriage system with a small quantity of dust to a wafer from the outside.

A semiconductor wafer W with a device pattern is carried from an etching system 20 to a mounting system 200 in an in-line wafer carriage system 300. The wafer carriage mechanism 300 includes a temporarily mounting stage 301 pivotally supported by a rotation shaft 303, a supporting member 304 of the rotation shaft 303, a rotation driving mechanism 162 for the rotation shaft 303, and driving mechanisms 306, 307, and 308 for reciprocating the supporting member 304 in an orbital path surrounded with a tubular dome chamber 316. The in-line wafer carriage system 300 is stored in a transparent resin-made dome chamber 316.

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JP3565132	DRY ETCHING PROCESS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
JPH0682636	[Title of Invention] Dry etching method
JPS57152142	TRANSFERRING DEVICE OF SEMICONDUCTOR SUBSTRATE

Inventors:

IITSUNA TAKAAKI
OKONOGI HIROTAKA
SEKIDA SABURO

Application Number:

JP2000346081A

Publication Date:

May 24, 2002

Filing Date:

November 14, 2000

Export Citation:

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Assignee:

OKAMOTO MACHINE TOOL WORKS

International Classes:

H01L21/302; H01L21/304; H01L21/3065; H01L21/677; H01L21/68; (IPC1-7): H01L21/304; H01L21/3065; H01L21/68

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