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Title:
NEGATIVE TYPE RADIATION SENSITIVE MIXTURE AND RADIATION SENSITIVE RECORDING MATERIAL PRODUCED BY USING THE SAME
Document Type and Number:
Japanese Patent JPH0627669
Kind Code:
A
Abstract:

PURPOSE: To provide a radiation sensitive recording material which is particularly preferable for production of photoresists, production of electronic parts and printing plates or for chemical milling.

CONSTITUTION: This negative type radiation sensitive mixture contains (a) a compd. which contains at least one piece of -CBr3 groups bonded to the atom not bonded to a hydrogen atom and forms a strong acid at the exposure to active radiations, (b) a compd. contg. at least two pieces of acid crosslinkable groups and (c) a water-insoluble high-polymer binder which is soluble or at least swellable in an aq. alkaline soln. and contains a phenolic OH group.


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Inventors:
GEORUKU PAUROUSUKII
RARUFU DAMERU
HORUSUTO REESHIERUTO
UINFURIITO MAIAA
WARUTAA SHIYUPIISU
KURAUSUUYURUGEN PURUTSUIBIRA
Application Number:
JP20131892A
Publication Date:
February 04, 1994
Filing Date:
July 28, 1992
Export Citation:
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Assignee:
HOECHST AG
International Classes:
C04B41/50; G03F7/029; G03F7/038; H01L21/027; G03F7/00; (IPC1-7): G03F7/038; G03F7/00; G03F7/029; H01L21/027
Domestic Patent References:
JPH06254446A1994-09-13
JP2005193229A2005-07-21
JP2008212919A2008-09-18
JP2011147939A2011-08-04
Foreign References:
DE102011111328A12013-02-28
WO2010150694A12010-12-29
Attorney, Agent or Firm:
Kazuo Sato (2 outside)



 
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